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European Tender Electron Beam Lithography system

Universiteit Twente · Open · 1 lots · 429052
Type
Supplies
38000000 · Laboratory instruments
Estimated value
€ 3,50M
estimated
To deadline
59d
Aug 14, 2026 · 10:00
Knock-outs
n/a
exclusion grounds
Award basis
Best price-quality ratio
Assess manuallyconfidence low

Universiteit Twente (MESA+ Institute) is purchasing a high-end Electron Beam Lithography system for research and industrial use. The contract has a high value of €3.5 million and focuses on a highly specialized machine for patterning substrates up to 200mm. Given the technical complexity and the value, this is a large, specialized delivery.

Supplies · Open · European procedure

European
Contracting authority
Universiteit Twente
Europees
Contract type
Supplies
Open
Estimated value
€3,500,000
estimated value
Submission deadline
August 14, 2026
10:00
Scope
European
European procedure
Lots
1
1 lots
Main CPV code
38000000
Laboratory instruments, optical and precision instruments (excluding eyewear)
Location
NL (NUTS: NL213), Europees
CharacteristicsCPV 38SuppliesEU tender

01What is being requested

Universiteit Twente (MESA+ Institute) is purchasing a high-end Electron Beam Lithography system for research and industrial use. The contract has a high value of €3.5 million and focuses on a highly specialized machine for patterning substrates up to 200mm. Given the technical complexity and the value, this is a large, specialized delivery.

The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (e-beam system). A system, suitable for defining patterns in electron sensitive resists, at high resolution and high speed, compatible with a wide range of applications and substrate types up to 200mm in diameter. The system will be used by a wide range of users, i.e. academic researchers and students as well as industrial engineers with different backgrounds (photonics, (nano)-electronics etc.) and different levels of

38000000€ 3,50MSupplies
1European Tender Electron Beam Lithography system€3,500,000

02Exclusion grounds

Exclusion grounds — consult the ESPD
  • No specific exclusion grounds were extracted. In a European tender, the mandatory and discretionary grounds of art. 2.86/2.87 of the Dutch Procurement Act almost always apply — check the European Single Procurement Document (ESPD).

03Value in context

€3,500,000

04Likely competitors

#Likely bidderFitWins
1Bruker Nederland B.V.SME8913×
2Agilent Technologies Netherlands B.V.SME8610×
3Waters Chromatography B.V.SME8412×
4Carl Zeiss B.V.SME8310×
5FEI Europe B.V.SME827×
6Oxford Instruments GmbHUnknown815×

05Tender documents

Appendix E Draft agreement EBL system.pdfpdfJun 14, 2026 · 236 KB
Appendix B Schedule of Requirements and Wishes.docxdocxJun 14, 2026 · 101 KB
Appendix B Schedule of Requirements and Wishes.docxdocxJun 14, 2026 · 101 KB
aisut-2019-uk.pdfpdfJun 14, 2026 · 114 KB
Beschrijving.pdfpdfJun 14, 2026 · 27 KB
Appendix E Draft agreement EBL system.pdfpdfJun 14, 2026 · 236 KB
Grounds for Exclusion and Eligibility Requirements.pdfpdfJun 14, 2026 · 29 KB
Purchasing Conditions.pdfpdfJun 14, 2026 · 22 KB
Descriptive Document EBL system.pdfpdfJun 14, 2026 · 447 KB
Inschrijvingsfase.pdfpdfJun 14, 2026 · 27 KB
Draft Agreement.pdfpdfJun 14, 2026 · 22 KB
aisut-2019-uk.pdfpdfJun 14, 2026 · 114 KB

06Legal themes that may be relevant here

07Frequently asked questions

What is the technical core task of this tender?
The contract concerns the delivery of an Electron Beam Lithography system that is suitable for defining patterns in electron-sensitive resists with high resolution and speed.
What specifications must the delivered system meet regarding substrates?
The system must be compatible with a wide range of applications and substrates with a diameter up to 200mm.
Which target groups is the Electron Beam system intended for?
The system is used by a diverse group of users, including academic researchers, students, and industrial engineers from photonics and (nano)-electronics.
What are the main suitability requirements for the supplier?
The supplier must have the capacity to deliver systems that are compatible with a wide range of applications and substrates.

Automatically compiled from the official tender data and documents.

08Estimated value versus the market

p25
€ 300K
median
€ 515K
p75
€ 1,7 mln
€ 3,5 mln

Gegunde waarden in CPV 38 · leveringen n=331